Магнетронные распылительные системы
Кроме того, они широко используются в промышленных установках для нанесения тонкопленочных покрытий. Это – всевозможные фильтрующие, отражающие, защитные и теплосберегающие оптические покрытия на стеклах.
Магнетронные системы нашли широкое применение в вопросах плазмохимической обработки, травления и получения материалов.
Несмотря на всю широту использования магнетронных систем распыления, нельзя утверждать то, что к настоящему моменту они являются достаточно хорошо изученными. Все большее практическое применение МРС значительно опередило разработку теории и методику их расчета.
5 Conclusion
The paper presents review of basic magnetron sputtering system constructions, some construction elements (targets, magnetic systems and so on), key parameters and typical magnetron characteristics are described as well. Besides, the dependences of the working space parameters on the magnetron discharge plasma are presented. Moreover, comparative characteristics of the different magnetron sputtering systems constructions and their advantages and limitations are described. For example, the critical discharge characteristics of the planar magnetron are given, such as volt-ampere and the power discharge characteristics and influence on those ones the magnetic field and process gas pressure values. The study also presents characteristics of material, the targets made. Then, there are described the magnetron operations, behavior of the species in discharge plasma, magnetic and electric fields distributions.
In conclusion it is necessary to point out, that potential possibilities of the magnetron sputtering system applications have not been studied quite sufficiently. But by now the magnetron sputtering system usage is already prevailing. Those ones are widely used in the manufacturing of semi-conductor devices and integrated circuits. In particular, those systems are engaged for the interconnection formatting to the semi-conductor and passive elements of the circuits, the hybrid microcircuit resistive films producing, magnetic films, low-resistance contacts and so on.
Moreover the magnetron sputtering systems are widely used in commercial plants for thin film deposition, namely for various color filtering, reflective, protective and low-emission optical glass coatings.
Magnetron systems have found their application for solving the problems regarding to the plasmochemistry processing, etching and producing the materials.
Though magnetron system is widely used, at present, one cannot say that, they are studied sufficiently. The wide propagation of the magnetron sputtering system passed ahead of theoretical background of the problem.
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